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Electric-field-controlled interface strain coupling and non-volatile resistance switching of La1-xBaxMnO3 thin films epitaxially grown on relaxor-based ferroelectric single crystals

机译:弛豫基铁电单晶上外延生长的La1-xBaxMnO3薄膜的电场控制界面应变耦合和非易失性电阻转换

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摘要

We have fabricated magnetoelectric heterostructures by growing ferromagnetic La1-xBaxMnO3 (x = 0.2, 0.4) thin films on (001)-, (110)-, and (111)-oriented 0.31Pb(In1/2Nb1/2)O-3-0.35Pb(Mg-1/3 wNb(1/2))O-3-0.34PbTiO(3) (PINT) ferroelectric single-crystal substrates. Upon poling along the [001], [110], or [111] crystal direction, the electric-field-induced non-180 degrees domain switching gives rise to a decrease in the resistance and an enhancement of the metal-to-insulator transition temperature T-C of the films. By taking advantage of the 180 degrees ferroelectric domain switching, we identify that such changes in the resistance and T-C are caused by domain switching-induced strain but not domain switching-induced accumulation or depletion of charge carriers at the interface. Further, we found that the domain switching-induced strain effects can be efficiently controlled by a magnetic field, mediated by the electronic phase separation. Moreover, we determined the evolution of the strength of the electronic phase separation against temperature and magnetic field by recording the strain-tunability of the resistance [(Delta R/R)(strain)] under magnetic fields. Additionally, opposing effects of domain switching-induced strain on ferromagnetism above and below 197K for the La0.8Ba0.2MnO3 film and 150K for the La0.6Ba0.4MnO3 film, respectively, were observed and explained by the magnetoelastic effect through adjusting the magnetic anisotropy. Finally, using the reversible ferroelastic domain switching of the PINT, we realized non-volatile resistance switching of the films at room temperature, implying potential applications of the magnetoelectric heterostructure in non-volatile memory devices.
机译:我们通过在(001)-,(110)-和(111)取向的0.31Pb(In1 / 2Nb1 / 2)O-3-上生长铁磁La1-xBaxMnO3(x = 0.2,0.4)薄膜来制造磁电异质结构0.35Pb(Mg-1 / 3 wNb(1/2))O-3-0.34PbTiO(3)(PINT)铁电单晶衬底。沿[001],[110]或[111]晶体方向极化时,电场感应的非180度域切换会导致电阻减小,并增强金属到绝缘体的过渡膜的温度TC。通过利用180度铁电畴切换的优势,我们发现电阻和T-C的这种变化是由畴切换引起的应变引起的,而不是畴切换引起的界面处电荷载流子的积累或耗尽。此外,我们发现,通过电子相分离介导的磁场可以有效地控制畴切换引起的应变效应。此外,我们通过记录磁场下电阻[(Delta R / R)(strain)]的应变可调性来确定电子相分离强度对温度和磁场的演变。另外,通过调节磁各向异性通过磁弹性效应观察和解释了畴转换感应应变分别对La0.8Ba0.2MnO3膜和197K之上和之下197K上下的铁磁性的相反影响。 。最后,使用PINT的可逆铁弹性域切换,我们实现了薄膜在室温下的非易失性电阻切换,这暗示了磁电异质结构在非易失性存储设备中的潜在应用。

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